Huawei has filed a patent application describing an ultra-hard ultraviolet lithography scanner, UDN reports. If the company can build such a scanner and achieve quality, long uptime and reasonable yields, Chinese companies will have access to sub-7nm technologies.
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Huawei submitted the documents to the National Intellectual Property Administration in mid-November. The application is registered with the number 202110524685X, according to MyDrivers. The patent application covers the key components of the EUV scanner, including a 13.5 nm light generator, a set of mirrors and a lithography system. Unfortunately, this document does not represent the actual capacity of Huawei to build this complex machine, which has many advanced components capable of a longer period of time for a perfect coordinated operation. Even if the quantity of raw materials is available, production should be sane.
The EUV scanner with an aperture of 0.33 is the most advanced technology today, but many companies have tried to build it but only the Dutch ASML has achieved success at the cost of more than a decade of research and support. Only five companies in the world use or are now going to use this equipment: Intel, Micron, Samsung, SK Hynix and TSMC. But they also independently developed or are planning to develop quite complex technological processes that can allow the EUV scanner to use. The Chinese company SMIC couldn’t obtain such equipment, despite having already bought it, there is a demand for it in the country, and Huawei is apparently trying to satisfy it.
Huawei, a company with a total of $100 million in annual revenue, works on diverse projects in a wide range of fields. In the semiconductor industry, its goals are not limited to the release of chips. The company is clearly interested in creating equipment for the production of silicon wafers.
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